Sputtering Targets
All Standard Sputtering Targets (Product Name D-M) are listed here. If you don’t find the one you’re looking for, please kindly contact us. We can handle custom work.
EPI Materials is a global provider of exceptional customer service and high-quality thin-film materials (sputtering targets and evaporation materials), with a goal of enabling the innovation, creation, and advancement of a vast array of products.
We help our customers compete and succeed on the leading edge of technology. Built on a tradition of customer service and quality. EPI aims to become a world-class supplier of thin-film materials.

Sputtering Target Material Names D – M:
Dysprosium, Dy (sputtering target)
Erbium, Er (sputtering target)
Erbium Oxide, Er2O3 (sputtering target)
Europium, Eu (sputtering target)
Europium Nickel Oxide, EuNiO3 (sputtering target)
Europium Titanate, EuTiO3 (sputtering target)
Gadolinium, Gd (sputtering target)
Gadolinium Cerium Oxide, Gd0.2Ce0.8O2 (sputtering target)
Germanium, Ge (sputtering target)
Germanium Telluride, GeTe (sputtering target)
Germanium Antimony Telluride, Ge2Sb2Te5 (sputtering target)
Gold, Au (sputtering target)
Hafnium, Hf (sputtering target)
Hafnium Carbide, HfC (sputtering target)
Hafnium Nitride, HfN (sputtering target)
Hafnium Oxide, HfO2 (sputtering target)
Holmium, Ho (sputtering target)
Indium, In (sputtering target)
Indium Aluminum Zinc Oxide, In2O3/Al2O3/ZnO 65/16/19 wt% (sputtering target)
Indium Gallium Zinc Oxide, InGaZnOx (sputtering target)
Indium Iron Oxide, InFe2O4 (sputtering target)
Indium Molybdenum Oxide, In2O3/Mo 98/2 wt% (sputtering target)
Indium Oxide, In2O3 (sputtering target)
Indium Tin Oxide, ITO, In2O3/SnO2, 90/10 wt% (sputtering target)
Indium Zinc Oxide, IZO, In2O3/ZnO, 90/10 wt% (sputtering target)
Iridium, Ir (sputtering target)
Iron, Fe (sputtering target)
Iron Oxide, Fe2O3 (sputtering target)
Lanthanum, La (sputtering target)
Lanthanum Aluminate, LaAlO3 (sputtering target)
Lanthanum Calcium Manganate, La0.5Ca0.5MnO3 (sputtering target)
Lanthanum Calcium Manganate, La0.7Ca0.3MnO3 (sputtering target)
Lanthanum Calcium Manganate, La1-xCaxMnO3 (sputtering target)
Lanthanum Copper Manganate, La2CuMnO6 (sputtering target)
Lanthanum Copper Oxide, La2CuO4 (sputtering target)
Lanthanum Ferrite, LaFeO3 (sputtering target)
Lanthanum Gallate, LaGaO3 (sputtering target)
Lanthanum Hexaboride, LaB6 (sputtering target)
Lanthanum Lithium Titanate, La(1-x) LixTiO3 (sputtering target)
Lanthanum Manganate, LaMnO3 (sputtering target)
Lanthanum Nickel Oxide, LaNiO3 (sputtering target)
Lanthanum Praseodymium Calcium Manganate, La(1-x-y)PrxCayMnO3 (sputtering target)
Lanthanum Scandium Oxide, LaScO3 (sputtering target)
Lanthanum Strontium Chromate, La(1-x)SrxCrO3 (sputtering target)
Lanthanum Strontium Cobalt Oxide, La0.5Sr0.5CoO3 (sputtering target)
Lanthanum Strontium Copper Oxide, La(1-x)SrxCuO4 (sputtering target)
Lanthanum Strontium Manganate, La0.9Sr0.1MnO3 (sputtering target)
Lanthanum Titanate, LaTiO3 (sputtering target)
Lanthanum Vanadium Oxide (sputtering target)
Lead, Pb (sputtering target)
Lead Calcium Titanate, Pb0.7Ca0.3TiO3 (sputtering target)
Lead Lanthanum Zirconium Titanate, PLZT, Pb1-xLax(ZryTi1-y)1-0.25xO3 (sputtering target)
Lead Telluride, PbTe (sputtering target)
Lead Titanate, PbTiO3 (sputtering target)
Lead Zirconate Titanate with Niobium, PbZr0.52Ti0.48O3 with 1 at% Nb (sputtering target)
Lead Zirconate, PbZrO3 (sputtering target)
Lead Zirconium Titanate, PZT, PbZr0.52Ti0.48O3 (sputtering target)
Lead Zirconium Titanate, PZT, (Various Compositions) (sputtering target)
Lithium Cobalt Oxide, LiCoO2 (sputtering target)
Lithium Nickel Cobalt Oxide, LiNi(1-x)CoxO2 (sputtering target)
Lithium Niobate, LiNbO3 (sputtering target)
Lithium Phosphate, Li3PO4 (sputtering target)
Lithium Silicate, Li4SiO4 (sputtering target)
Lithium Titanate, Li4Ti5O12 (sputtering target)
Lithium Zirconate, Li6Zr2O7 (sputtering target)
Magnesium, Mg (sputtering target)
Magnesium Fluoride, MgF2 (sputtering target)
Magnesium Oxide, MgO (sputtering target)
Magnesium Silicide, Mg2Si (sputtering target)
Magnesium Zinc Oxide, Mg(1-x) ZnxO (sputtering target)
Manganese, Mn (sputtering target)
Manganese Cobalt Oxide, MnCo2O4 (sputtering target)
Manganese Oxide, MnO (sputtering target)
Molybdenum, Mo (sputtering target)
Molybdenum Carbide, Mo2C (sputtering target)
Molybdenum Disilicide, MoSi2 (sputtering target)
Molybdenum Disulfide, MoS2 (sputtering target)
Molybdenum Oxide, MoO3 (sputtering target)