Sputtering Targets

All Standard Sputtering Targets (Product Name T-Z) are listed here. If you don’t find the one you’re looking for, please kindly contact us. We can handle custom work.

EPI Materials is a global provider of exceptional customer service and high-quality thin-film materials (sputtering targets and evaporation materials), with a goal of enabling the innovation, creation, and advancement of a vast array of products.
We help our customers compete and succeed on the leading edge of technology. Built on a tradition of customer service and quality. EPI aims to become a world-class supplier of thin-film materials.

Sputtering Target Material Names T – Z:

Tantalum, Ta (sputtering target)
Tantalum Carbide, TaC (sputtering target)
Tantalum Nitride, TaN (sputtering target)
Tantalum Oxide, Ta2O5 (sputtering target)
Tantalum Silicide, TaSi2 (sputtering target)
Tellurium, Te (sputtering target)
Terbium, Tb (sputtering target)
Terbium Manganate, TbMnO3 (sputtering target)
Tin, Sn (sputtering target)
Tin Oxide, SnO2 (sputtering target)
Titanium, Ti (sputtering target)
Titanium Boride, TiB2 (sputtering target)
Titanium Carbide, TiC (sputtering target)
Titanium Dioxide, TiO2 (sputtering target)
Titanium Disilicide, TiSi2 (sputtering target)
Titanium Ferrite, TiFe2O4 (sputtering target)
Titanium Monoxide, TiO (sputtering target)
Titanium Nitride, TiN (sputtering target)
Titanium Silicate, Ti0.44Si0.10O (sputtering target)
Tungsten, W (sputtering target)
Tungsten Carbide, WC (sputtering target)
Tungsten Disilicide, WSi2 (sputtering target)
Tungsten Disulfide, WS2 (sputtering target)
Tungsten Oxide, WO3 (sputtering target)
Tungsten Titanium, W/Ti (sputtering target)

Vanadium, V (sputtering target)
Vanadium Carbide, VC (sputtering target)
Vanadium Oxide, V2O5 (sputtering target)

Ytterbium, Yb (sputtering target)
Ytterbium Oxide, Yb2O3 (sputtering target)
Yttrium, Y (sputtering target)
Yttrium Ferrite, Y3Fe5O12 (sputtering target)
Yttrium Manganate, YMnO3 (sputtering target)
Yttrium Oxide, Y2O3 (sputtering target)

Zinc, Zn (sputtering target)
Zinc Oxide, ZnO (sputtering target)
Zinc Oxide Alumina, ZnO/Al2O3 (2% Standard Doping) (sputtering target)
Zinc Oxide doped with Gallium Oxide, ZnO/Ga2O3 95/05 wt% (sputtering target)
Zinc Oxide doped with Magnesium, Zn0.9Mg0.1O (sputtering target)
Zinc Oxide doped with Manganese, ZnO with 0.3 wt% Mn (sputtering target)
Zinc Oxide doped with Manganese, ZnO with 4 wt% Mn (sputtering target)
Zinc Oxide doped with Scandia, ZnO/Sc2O3 98/02 wt% (sputtering target)
Zinc Oxide doped with Sodium, Zn0.99Na0.01O (sputtering target)
Zinc Selenide, ZnSe (sputtering target)
Zinc Sulfide, ZnS (sputtering target)
Zinc Telluride, ZnTe (sputtering target)
Zirconium, Zr (sputtering target)
Zirconium Carbide, ZrC (sputtering target)
Zirconium Nitride, ZrN (sputtering target)
Zirconium Oxide, ZrO2 (fully stabilized – Y2O3) (sputtering target)